Genxplor R&D MBE系统

业界最先进,高性能的研发系统,由主要研究人员选择

Genxplor.
The GENxplor® R&D MBE System, awared the CSindustry Award for compound semiconductor manufacturing, uses Veeco’s proven 3″ growth chamber design and features unmatched process flexibility – perfect for materials research on emerging technologies such as UV LEDs, high-efficiency solar cell and high-temperature superconductors. Its efficient, single frame design combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. Because the manual system is integrated on a single frame, installation time is reduced. The open architecture design on the GENxplor also improves ease-of-use, provides convenient access to effusion cells and allows easier serviceability when compared to other MBE systems.
  • 高品质的外延层上直径高达3英寸的基板
  • 极端电子束温度加热器(> 1850°C)
  • 独特的单帧架构可提高易用性,提供方便的源访问和增强的可携带性
  • 高效,一体化设计将手动系统与车载电子设备相比,与其他MBE系统相比,节省了40%的实验室空间
  • 适用于在包括GaAs,氮化物和氧化物的各种材料上的尖端研究
  • Molly®软件集成了简单的食谱写作,自动化生长控制和始终开启数据录制
  • 可选的Nova™超高温衬底加热器,可在1850°处成熟性能
  • 直接可扩展性Gen20™,Gen200®和Gen2000®MBE系统

CS行业创新奖 -  Genxcel MBE系统

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